ID 原文 译文
44216 结果显示,在 FA/O 阻挡层抛光液中加入 1. 5 g /L 助溶剂和体积分数 0. 05% H2O2 SiO2和铜的去除速率选择比最优,为 1. 96。 The results show that the best ratio of the removal rate of SiO2 and copperis 1.96 when 1.5 g /L cosolvent and 0.05% volume fraction of H2O2 added in the FA/O barrier slurry.
44217 同时,添加了助溶剂和 H2O2 FA/O 阻挡层抛光液对碟形坑修正的能力为 48. 2 nm,对蚀坑修正的能力为 38. 9 nm,修正能力非常强。 At the same time, the ability of FA/O barrier slurry by adding the cosolvent and H2O2 to correct the dishing is 48.2 nm, and the erosion is 38.9 nm, so the correction ability is very strong.
44218 铜布线片阻挡层抛光后,碟形坑深度为 4. 7 nm,蚀坑深度为 19. 9 nm, After the CMP ofthe barrier layer of patterned Cu wafer, the dishing depth is 4.7 nm and the erosion depth is 19.9 nm.
44219 将碟形坑和蚀坑的深度降到较小的范围。 The depth of the dishing and the erosion is reduced to a smaller extent.
44220 SEM 检测结果表明,铜残留较少,表面形貌较好。 The SEM test results show that theresidual copper defects are less and the surface morphology is better.
44221 分析了目前分段电流舵数模转换器 ( DAC) 在动态性能提升和芯片面积缩小等方面的局限性。 Limitations of dynamic performance promoting and chips area reducing for the segmented current-steering digital-to-analog converter (DAC) were analyzed.
44222 提出了动态元件匹配 ( DEM) 译码技术。 A decoding technology called dynamic element matching (DEM) was proposed.
44223 设计了 16 bit DAC 中的 DEM 译码电路结构,分析了 DEM 译码技术的原理。 The DEM decoding circuit of 16 bit DAC were designed, and the principle of the DEM decoding technology were analyzed.
44224 对该 16 bit DAC 的动态性能等进行了详细仿真,并完成了整体版图设计。 The dynamic performances of the 16 bit DAC were simulated and the layout was designed.
44225 DAC 核心部分芯片面积仅为 2. 2 mm2。 The core chip area of the DAC was only 2.2 mm2.