ID |
原文 |
译文 |
41866 |
并搭建了相应的测试系统,对不同厂家的 UVCLED 进行了测量和性能评价。 |
The corresponding test system was built to measure and evaluate the performance of the UVC-LED from differentmanufacturers. |
41867 |
实验结果表明,该测试方法和系统能够用于快速评价 UVC-LED 芯片质量,为企业提供了一种高效、简便的 UVC-LED 芯片质量评价方法。 |
The experimental results show that the test method and system can be used to quicklyevaluate the quality of UVC-LED chips, and it provides an efficient and simple quality evaluation methodof UVC-LED chips for the manufacturers. |
41868 |
紫外光在各领域应用广泛,制备高性能紫外光电探测器 ( UV PD) 受到研究人员的重视。 |
Ultraviolet light is widely used in various fields, and the preparation of ultraviolet photodetectors (UV PDs) with high performance has attracted the attention of researchers. |
41869 |
GaN 作为宽禁带半导体材料,具有高电子迁移率、稳定的物理化学性质、高击穿电压、低暗电流和固有可见盲区的特点。 |
As a wide bandgapsemiconductor material, GaN has the characteristics of high electron mobility, stable physical chemicalproperties, high breakdown voltage, low dark current and inherent visible-blind area. |
41870 |
GaN 基 UV PD 具有制备工艺简单、体积小无需附加滤光系统、易于与其他材料集成等特点,表现出优异的紫外光探测性能。 |
GaN-based UVPD has the advantages of simple preparation process, small size, no additional filter system, easy integration with other materials and so on, showing an excellent ultraviolet detection performance. |
41871 |
围绕 GaN 基 UV PD,介绍了 GaN材料在制备工艺上的研究进展; |
Based onthe GaN-based UV PD, firstly, the research progress in the preparation process of GaN materials isintroduced. |
41872 |
详细论述了常见结构 GaN 基 UV PD 最新结构的优化对器件性能的影响; |
Subsequently, the influences of the latest structural optimization of the common structuralGaN-based UV PD on the device performance are discussed in detail, |
41873 |
介绍了基于表面声波、表面等离激元和场效应晶体管集成的新型 GaN 基 UV PD; |
and several new GaN-based UVPDs based on the surface acoustic wave, surface plasmon and field effect transistor integration are introduced. |
41874 |
最后,对 GaN 基 UV PD 的发展趋势进行了展望。 |
Finally, the development trend of the GaN-based UV PD is prospected. |
41875 |
在全耗尽绝缘体上硅 ( FDSOI) 衬底上制备了一种新型隧穿场效应晶体管 ( TFET) , |
A novel tunneling field effect transistor (TFET) was prepared on fully depleted siliconon-insulator (FDSOI) substrate. |