ID 原文 译文
16055 仿真和实验研究表明，该技术成功消除了零级像和孪生像的干扰，能够实时记录待测物的动态变化，快速获得微米级分辨率的再现图像。 The simulation and experimental results show that the technique successfully eliminates the interference of zero-order and twin images,and can record the dynamic changes of the objects to be measured in real time,and quickly obtain the reproduced image with micron resolution.
16056 为实现在表面等离子体光刻机中对掩模与基片间的间隙测量，提出一种基于白光干涉测量技术的掩模-基片间隙测量方法，并设计了以ZYNQ芯片为核心的信号处理系统。 In order to realize the gap measurement between the mask and the substrate in the surface plasma lithography machine,a gap measurement method of the mask-substrate gap was proposed based on white light interferometry,and a signal processing system was designed based on ZYNQ.ZYNQ's on-chip ARM was used for parameter setting,drive control,and front-end display.
16057 以ZYNQ芯片的片上ARM用作参数设定、驱动控制以及前端显示，以可编程逻辑资源用于实现光谱数据的小波处理和互相关解调。 The programmable logic resources were used to realize wavelet processing and cross-correlation demodulation of spectral data.
16058 系统以分布并行结构运行，大大提高了测量速度，并实现了对掩模-基片间隙的实时测量。 This system operated in a distributed parallel structure,which could greatly improve the detection speed,and realize the real-time measurement of the mask-substrate gap.
16059 最后为了确定测量精度，搭建了激光干涉仪精度测试平台。 Finally,in order to determine the measurement accuracy,a laser interferometer accuracy test platform were built.Test experiments showed that the repeat measurement accuracy was 4.4 nm,and the displacement measurement accuracy was 6.7 nm.
16060 测试实验表明，间隙测量的重复测量精度为4.4 nm，位移测量精度为6.7 nm，满足间隙测量性能稳定和精度高等要求。 It could satisfy the gap measurement system requirements of stabilization and higher precision.
16061 利用中心对称标记的中心旋转不变特性，提出了一种基于自归一化积相关（SNCC）的模板匹配方法。 A template matching method based on SNCC(self-normalized cross correlation)was proposed,which was based on the invariance of center rotation of centro-symmetric markers.
16062 该方法对由于TFT制程工艺导致的非线性缩放变形以及标记离焦情形，具有较强的工艺适应性。 This method had strong process adaptability to the non-linear scaling deformation caused by TFT process and the defocusing of markers.
16063 通过对TFT工艺变形的对准标记以及离焦的对准标记对比测试，验证了在此工况条件下，基于SNCC方法的测量结果相对NCC及几何模版匹配算法具有更高的可信度，可以满足中心对称标记亚像素级的精确定位及测量需求。 Through the contrast test of alignment mark and defocus alignment mark of TFT process deformation,it was verified that under this condition,the measurement results based on SNCC method had higher reliability than NCC(normalized cross correlation)and geometric template matching algorithm,and could meet the needs of accurate positioning and measurement at sub-pixel level of centrosymmetric marker.
16064 相对于传统标记中心定位方法，在对准标记产生工艺形变或对准离焦时，研究方法依旧可以获取高的可信度测量结果。 Compared with the traditional mark center positioning method,the proposed method could still obtain high reliability measurement results when the alignment mark produced process deformation or alignment defocusing.